产品名称:纳米压印胶
详细介绍:
类型 | 光刻胶型号 | 适用光谱 | 厚度范围/um | 分辨率 | 适用工艺 | 可用显影液 | 可用去胶液 |
纳米压印胶 | mr-NIL 6000E | 热固化和UV固化 | 0.1-1 | 50nm | 可用于纳米图形的制造、刻蚀、多层系统等 | ||
mr-I 9000M | 热固化 | 0.1-1 | 50nm | ||||
mr-UVCur21 | UV固化 | 0.1-5 | 50nm |
Resist ma-P 1215G ma-P 1225G ma-P 1275G
Film thickness * µm 1.5 2.5 9.5 15 30 60
Spin-coating
rpm
s
3000
30
3000
30
3000
30
1500
30
500
60
1000
4
Spectral sensitivity nm 350 - 450
Exposure dose @ 365 nm** mJ cm-2 50 - 70 70 - 110 150 - 5000
Developer ma-D 532/S, mr-D 526/S (TMAH based) for greyscalelithography
ma-D 331 (NaOH based) for standard lithography